Thin film optical lens and method for coating a lens

ABSTRACT

A thin film optical lens and method for coating an optical substrate serves to apply alternating layers, with varying thicknesses, of a high index dielectric material and a low index dielectric material on first and second surfaces of an optical substrate. The high and low index dielectric materials are layered through thin film deposition. The low index dielectric material is SiO2. The high index dielectric material is ZrO2 and/or Indium Zinc Oxide. The spectral results from application of high and low index dielectric materials reduce infrared radiation, block HEV light transmission, and reduce backside ultraviolet reflections, while also increasing visible (ultraviolet) light transmission through the optical substrate. Thus, the layering of dielectric materials on the first surface of optical substrate reflects up to 40% of the infrared radiation; and the second surface of optical substrate transmits up to 99% of ultraviolet light in the wavelength range between 300 to 400 nanometers.

CROSS-REFERENCE TO RELATED APPLICATIONS

This application claims the benefits of U.S. provisional application No.62/838,751 filed Apr. 25, 2019 and entitled THIN FILM OPTICAL LENSCOATING METHOD, which provisional application is incorporated byreference herein in its entirety.

FIELD OF THE INVENTION

The present invention relates generally to a thin film optical lens andmethod for coating a lens. More so, the method is configured to treat anoptical substrate with alternating layers of a low index dielectricmaterial and a high index dielectric material of varying thicknesses;whereby the application of dielectric materials in this combinationserve to reduce infrared radiation, block HEV light transmission, andreduce backside ultraviolet reflections, while also increasing visiblelight transmission through the optical substrate.

BACKGROUND OF THE INVENTION

The following background information may present examples of specificaspects of the prior art (e.g., without limitation, approaches, facts,or common wisdom) that, while expected to be helpful to further educatethe reader as to additional aspects of the prior art, is not to beconstrued as limiting the present invention, or any embodiments thereof,to anything stated or implied therein or inferred thereupon.

Generally, a viewing lens is a transmissive optical device that focusesor disperses a light beam by means of refraction. A simple lens consistsof a single piece of transparent substrate, viewing lenses are primarilymade from optical glass and ground to certain specifications. Viewinglenses are planar, plano-convex, plano-concave, or double convex ordouble concave, and are ground as to have spherical or cylindricalsurfaces. Viewing lenses are a great help but often produceobjectionable reflections that interfere with the vision.

Typically, the human eye sees a wide range of light in many spectrumranges. The most desirable viewing range for humans are the visibleranges in wavelength from approximately 400 nanometers (4×10⁻⁷ m—violet)to 700 nm (7×10⁻⁷ m—red). Less desirable wavelengths can, however,create ultraviolet light, high-energy light, and infrared radiation.These lights are not efficacious for enhanced viewing. It is also knownthat the human eye does not perceive the UV wavelengths of light.Current viewing optical lenses and viewing surfaces reflect varyingamounts of light. These optical lenses and viewing surfaces are oftentreated to create visual effects or increased light transmission orsensitivity. It would be advantageous to have a process that treats anoptical substrate for producing a novel thin film optical lens designedto reduce infrared radiation, block HEV light transmission, increasevisible light transmission, and eliminate backside ultravioletreflection.

Other proposals have involved methods for coating lenses. The problemwith these lenses and methods of coating is that they do serve to reduceinfrared radiation, block HEV light transmission, and reduce backsideultraviolet reflections, while also increasing visible lighttransmission through the optical substrate. Even though the above citedmethods for coating lenses meet some of the needs of the market, a thinfilm optical lens and method for coating a lens for treating an opticalsubstrate with alternating layers of a low index dielectric material anda high index dielectric material of varying thicknesses; whereby theapplication of dielectric materials in this combination serve to reduceinfrared radiation, block HEV light transmission, and reduce backsideultraviolet reflections, while also increasing visible lighttransmission through the optical substrate, is still desired.

SUMMARY

Illustrative embodiments of the disclosure are generally directed to athin film optical lens and method for coating a lens. The method isconfigured to apply alternating layers with varying thicknesses of a lowindex dielectric material and a high index dielectric material on atleast one of the surfaces of an optical substrate. The low and highindex dielectric materials are layered on the optical substrate throughthin film deposition means to create a desired spectral result in theoptical substrate. The low index dielectric material can include SiO₂.The high index dielectric material can include ZrO₂, or possibly anIndium Zinc Oxide material.

The desired spectral results from application of the dielectricmaterials are effective for reducing infrared radiation, blocking HEVlight transmission, and reducing backside ultraviolet reflections, whilealso increasing visible light transmission through the opticalsubstrate. Another beneficial spectral result of the dielectricmaterials is that the visible light transmission through the opticalsubstrate increases. Additionally, as a result of layering thedielectric materials in this novel manner, the first surface of theoptical substrate reflects up to 40% of the infrared radiation. Andfurther, application of the dielectric material enables the secondsurface of the optical substrate to achieve high transmission up to 99%for regions in the wavelength range between 300 to 400 nanometers.

In a first embodiment of a method for coating a thin film optical lens,an initial Step comprises, providing an optical substrate, the opticalsubstrate comprising a first surface and an opposing second surface, thefirst surface being operable to at least partially reflect infraredradiation, the second surface being operable to at least partiallytransmit ultraviolet light in the wavelength range between 300 to 400nanometers.

Another Step may include cleaning the surfaces of the optical substrate.

The method also includes a Step of applying a low index dielectricmaterial and a high index dielectric material on at least one of thefirst and second surfaces of the optical substrate, the low indexdielectric material and the high index dielectric material being appliedin the following order.

A Step of applying about 145.00 nanometers of the low index dielectricmaterial on at least one of the first and second surfaces of the opticalsubstrate.

A Step of applying about 15.00 nanometers of the high index dielectricmaterial on at least one of the first and second surfaces of the opticalsubstrate.

A Step of applying about 17.00 nanometers of the low index dielectricmaterial on at least one of the first and second surfaces of the opticalsubstrate.

A Step of applying about 104.50 nanometers of the high index dielectricmaterial on at least one of the first and second surfaces of the opticalsubstrate.

A Step of applying about 153.00 nanometers of the low index dielectricmaterial on at least one of the first and second surfaces of the opticalsubstrate.

A Step of applying about 103.00 nanometers of the high index dielectricmaterial on at least one of the first and second surfaces of the opticalsubstrate.

Another Step may include applying about 75.00 nanometers of the lowindex dielectric material on at least one of the first and secondsurfaces of the optical substrate.

As a result of application of the dielectric materials, the firstsurface reflects up to 40% of the infrared radiation. And further,application of dielectric materials enable the second surface totransmit about 99% of the ultraviolet light in the wavelength rangebetween 300 to 400 nanometers.

Another Step may include flipping the optical substrate from the firstsurface to the second surface during application of the dielectricmaterials.

A final Step in the method comprises integrating the optical substrateinto a device.

In another aspect, the method further comprises a Step of hand-cleaningthe surfaces of the optical substrate.

In another aspect, the optical substrate comprises a viewing lens.

In another aspect, the low index dielectric material comprises SiO₂.

In another aspect, the SiO₂ comprises a refractive index of 1.46.

In another aspect, the high index dielectric material comprises ZrO₂.

In another aspect, the ZrO₂ comprises a refractive index of 2.06.

In another aspect, the high index dielectric material comprises IndiumZinc Oxide.

In another aspect, the dielectric material is applied with a thin filmdeposition mechanism.

In another aspect, the thin film deposition mechanism comprises anelectron beam evaporation and a magnetron reactive sputtering.

One objective of the present invention is to reduce infrared radiation,block HEV light transmission, and reduce backside ultravioletreflections, while also increasing visible light transmission through anoptical substrate, such as a viewing lens.

Another objective is to reduce the glare from ultraviolet wavelengthsfrom 300 to 400 nm down to as low as 1% off the second surface of theoptical substrate by treating the optical substrate with ananti-reflective dielectric material coating on at least one side of theoptical substrate.

Yet another objective is to reflect up to 40% of infrared radiation bytreating the optical substrate with an anti-reflective dielectricmaterial coating on at least one surface of the optical substrate.

Yet another objective is to absorb up to 40% of the high-energy visiblelight in the range of the spectrum from 400 to 455 nm.

Yet another objective is to produce a viewing optical substrate orviewing surface that has the appearance of little to no reflection inthe visible range of the electromagnetic spectrum.

Yet another objective is to provide an inexpensive to implement methodfor coating a thin film optical lens.

Other systems, devices, methods, features, and advantages will be orbecome apparent to one with skill in the art upon examination of thefollowing drawings and detailed description. It is intended that allsuch additional systems, methods, features, and advantages be includedwithin this description, be within the scope of the present disclosure,and be protected by the accompanying claims and drawings.

BRIEF DESCRIPTION OF THE DRAWINGS

The invention will now be described, by way of example, with referenceto the accompanying drawings, in which:

FIG. 1 shows a perspective view of an exemplary thin film optical lens,showing a first surface of an optical substrate being coated with a lowindex dielectric material, in accordance with an embodiment of thepresent invention;

FIG. 2 shows a perspective view of the thin film optical lens shown inFIG. 1, showing a second surface of an optical substrate being coatedwith a high index dielectric material, in accordance with an embodimentof the present invention;

FIG. 3 shows a perspective view of an exemplary thin film depositionmechanism coating an optical substrate with a dielectric material, inaccordance with an embodiment of the present invention;

FIG. 4 shows a graph depicting an example of the reflectance spectrum ofthis coating across the ultraviolet, visible and near infrared spectrum,in accordance with an embodiment of the present invention;

FIG. 5 shows a Table of a first embodiment of multiple coatings of lowindex dielectric materials and high index dielectric materials, inaccordance with an embodiment of the present invention;

FIG. 6 shows a graph depicting an example of the reflectance spectrum ofthis coating across the ultraviolet, visible and near infrared spectrum,in accordance with an embodiment of the present invention;

FIG. 7 shows a Table of a second embodiment of multiple coatings of lowindex dielectric materials, high index dielectric materials, and IZOmaterials, in accordance with an embodiment of the present invention;and

FIG. 8 shows a flowchart of an exemplary method for coating a thin filmoptical lens, in accordance with an embodiment of the present invention.

Like reference numerals refer to like parts throughout the various viewsof the drawings.

DETAILED DESCRIPTION OF THE INVENTION

The following detailed description is merely exemplary in nature and isnot intended to limit the described embodiments or the application anduses of the described embodiments. As used herein, the word “exemplary”or “illustrative” means “serving as an example, instance, orillustration.” Any implementation described herein as “exemplary” or“illustrative” is not necessarily to be construed as preferred oradvantageous over other implementations. All of the implementationsdescribed below are exemplary implementations provided to enable personsskilled in the art to make or use the embodiments of the disclosure andare not intended to limit the scope of the disclosure, which is definedby the claims. For purposes of description herein, the terms “upper,”“lower,” “left,” “rear,” “right,” “front,” “vertical,” “horizontal,” andderivatives thereof shall relate to the invention as oriented in FIG. 1.Furthermore, there is no intention to be bound by any expressed orimplied theory presented in the preceding technical field, background,brief summary or the following detailed description. It is also to beunderstood that the specific devices and processes illustrated in theattached drawings, and described in the following specification, aresimply exemplary embodiments of the inventive concepts defined in theappended claims. Specific dimensions and other physical characteristicsrelating to the embodiments disclosed herein are therefore not to beconsidered as limiting, unless the claims expressly state otherwise.

A thin film optical lens 100 and method 800 for coating a lens isreferenced in FIGS. 1-8. The thin film optical lens 100 provides anoptical substrate 102, such as a viewing lens, that is treated totransmit and reflect varying amounts and types of light, so as toenhance viewing therethrough. The method 800 applies multiplelayers/coats of both low index, and high index dielectric materials onat least one of the surfaces 104, 200 of optical substrate 102. Theresultant is that the optical substrate 102 reduces transmission ofinfrared radiation, blocks high-energy visible light (HEV light)transmission, and reduces backside ultraviolet reflections, all of whichserves to enhance viewing. The application of the dielectric materials106, 202, 204 also serves to increase visible light transmission, i.e.,ultraviolet light, through the optical substrate 102, which alsoenhances viewing therethrough.

The dielectric materials 106, 202, 204 that are applied to the surfacesof the optical substrate 102 include a unique combination of low indexdielectric materials 106 and high index dielectric materials 202, 204.The dielectric materials are applied in alternating layers on at leastone of the surfaces of the optical substrate 102. The method 800 alsomakes use of a thin film deposition mechanism 300, such as electron beamevaporation and magnetron reactive sputtering to apply the dielectricmaterials 106, 202, 204.

Those skilled in the art will recognize that the human eye sees a widerange of light in many spectrum ranges. The most desirable viewing rangefor humans are the visible ranges in wavelength from approximately 400nanometers (4×10⁻⁷ m—violet) to 700 nm (7×10⁻⁷ m—red). Other lightwavelengths can, however, create less desirable ultraviolet light,high-energy light, and infrared radiation. These lights are notefficacious for enhanced viewing. It is also known that the human eyedoes not perceive the UV wavelengths of light. The method 800 treats anoptical substrate 102 to create a novel thin film optical lens designedto reduce infrared radiation, block HEV light transmission, increasevisible light transmission, and eliminate backside ultravioletreflection.

Looking now at FIGS. 1-2, the optical substrate 102 provides a uniqueviewing lens that may include, without limitation, an optical lens, adielectric coated optic lens, a metallic coated optic lens, a mirror,and a variable reflectivity mirror. The optical substrate 102 may befabricated from glass or a polymer associated with viewing lenses. Theoptical substrate 102 may be planar, plano-convex, plano-concave, doubleconvex, or double concave. The optical substrate 102 may be ground as tohave spherical or cylindrical surfaces. In some embodiments, the opticalsubstrate 102 can be disc-shaped, rectangular-shaped, or square-shaped.

In one possible embodiment, the optical substrate 102 comprises a firstsurface 104 and an opposing second surface 200. The optical substrate102 also has an edge, of varying thicknesses, that forms a perimeternexus between the first and second surfaces 104, 200. The surfaces 104,200 are treated by coating with varying thicknesses of dielectricmaterials 106, 202, 204 independently of each other, so as to achieve adesired light reflection or transmission characteristic.

As FIG. 1 shows, the first surface 104 is treated to at least partiallyreflect infrared radiation. It is known in the art that infraredradiation is undesirable for enhanced viewing through a lens. Thistreatment may be prefabricated, prior to use of the method 800 onto theoptical substrate 102. Similarly, the second surface 200 is configuredto at least partially transmit ultraviolet light in the wavelength rangebetween 300 to 400 nanometers. It is known in the art that ultravioletlight enhances viewing through a lens. And as FIG. 2 illustrates, thesecond surface 200 may also be pretreated prior to use of the method 800onto the optical substrate 102. Additionally, the method 800 may requirethat the surfaces 104, 200 of the optical substrate 102 be cleaned witha cleaner to remove dust and debris prior to the application of thedielectric material. This cleaning process can include a blower or awiping mechanism. In another embodiment, the optical substrate 102 ishand-cleaned.

In some embodiments, the method 800 coats the optical substrate 102 witha low index dielectric material 106 and/or a high index dielectricmaterial 202 on at least one of the surfaces 104, 200, or possibly bothsurfaces simultaneously. The dielectric materials may include substancesthat are poor conductor of electricity, but also possess thecharacteristics of supporting electrostatic fields. The low indexdielectric material 106 and the high index dielectric material 202 arelayered onto the first and second surfaces 104, 200 in varyingthicknesses (nanometer thickness). In any case, different variations ofnanometer thickness, low index dielectric material 106, and high indexdielectric material 202 may also be used.

In one non-limiting embodiment, the low index dielectric material 106 isSiO₂. In some embodiments, the low index dielectric material 106 is amaterial having a low refractive index, indicating the speed throughwhich light passes therethrough. For example, the low index material hasa refractive index of about 1.46. In one non-limiting embodiment, thehigh index dielectric material 202 is ZrO₂, or in alternativeembodiments, Indium Zinc Oxide 204. The high index dielectric material202 is a material having a high refractive index, which is an indicationof the speed through which light passes through the optical substrate102. In one non-limiting embodiment, the high index material has arefractive index of 2.06. In alternative embodiments, additional indexdielectric materials that can be applied on the surfaces of the opticalsubstrate 102 may include, without limitation, Ag, Al, Al₂O₃, Au, Fe,Ge, MgF, Ti, TiO₂, and Zn.

As FIG. 3 references, a thin film deposition mechanism 300 is utilizedto apply the dielectric materials onto their respective surfaces 104,200. In some embodiments, the thin film deposition mechanism 300 mayinclude an electron beam evaporation device and/or a magnetron reactivesputtering device. In one exemplary operation of the thin filmdeposition mechanism 300, a target anode, such as the optical substrate102, is bombarded with an electron beam given off by a tungsten filamentunder high vacuum. The accelerated electrons strike the opticalsubstrate 102 and melt/sublimate the material to transform into thegaseous phase. These atoms then precipitate into solid form, coatingeverything in the vacuum chamber with a thin layer of the anodematerial. And as described above, the application occurs in a vacuumcoating system, either through electron beam gun evaporation techniquesor via magnetron sputtering techniques. The dielectric materials areconsequently integrated into the surfaces of the optical substrate 102.

In one non-limiting embodiment, the dielectric materials are applied toat least one of the first and second surfaces 104, 200 in a specific,layered arrangement. After cleaning the surfaces of the opticalsubstrate 102, the layering of dielectric materials is as follows:

About 145.00 nanometers of the SiO₂ (low index dielectric material 106)is applied to one or both surfaces of the optical substrate 102. Next, alayer of about 15.00 nanometers of the ZrO₂ (high index dielectricmaterial 202) is applied. In alternative embodiments, Indium Zinc Oxide204 (IZO) can be used instead of, or in conjunction with, the ZrO₂.Continuing with the application of the dielectric material through thethin film deposition mechanism 300, about 17.00 nanometers of the SiO₂is applied. An additional layer includes about 104.50 nanometers of theZrO₂ material. Continuing with the layering, about 153.00 nanometers ofthe SiO₂ is next applied to at least one of the surfaces. The method 800then requires that about 103.00 nanometers of the ZrO₂ material isapplied. Finally, about 75.00 nanometers of the SiO₂ material isapplied. While the following thicknesses of low and high index materialsare listed, the thicknesses of dielectric materials may be increased ordecreased to accommodate different types of optical substrates.

As a result of this novel application/coating process, the first surface104 of the optical substrate 102 reflects up to 40% of the infraredradiation, serving to enhance viewing through the optical substrate 102.It is advantageous to reflect as much infrared radiation as possible foroptimal viewing through the optical substrate 102.

Also, the view-enhancing ultraviolet light in the 300-400 nm range istransmitted up to 99% through the optical substrate 102.

Furthermore, the layered application of the low and high indexdielectric materials 202 enables the second surface 200 of the opticalsubstrate 102 to transmit up to 99% of the ultraviolet light in thewavelength range between 300 to 400 nanometers. In this manner, thedielectric materials substantially eliminate reflection of ultravioletlight (300-400 nm) off the surface of the optical substrate 102 into theeye by allowing the ultraviolet light to be transmitted and absorbed bythe optical substrate 102 itself. Thus, in the visible spectrum, thelayering of dielectric materials increases light transmission to the eyeby reducing the surface reflection to approximately 1%. In other words,only 1% of ultraviolet light is blocked by the treated optical substrate102. This effect on ultraviolet light can be advantageous for enhancingviewing through the optical substrate 102.

In a graphical illustration of the enhanced viewing, a reflectancespectrum graph 400 for the optical substrate 102 references the amountand effects of the dielectric materials on the optical substrate 102(See FIG. 4). The application, as described in the above steps, servesto reflect varying amounts of ultraviolet, visible light, and nearinfrared spectrum. As shown in the graph 400, at a wavelength less than340 nm and greater than 700 nm, the reflectance increases. This is adirect correlation to the first embodiment of the low and high indexdielectric materials applied to the optical substrate 102. Consequently,second surface 200 of the optical substrate 102 is designed to reflectvery little in the visible range of light between 400-700 nm, or the UVrange between 300-400 nm.

As Table 500 in FIG. 5 shows, the first embodiment of the method 800involves applying alternating layers of dielectric materials in multiplelayers of the low index dielectric material 106 and the high indexdielectric material 202, 204. This includes applying 145.00 nm of thelow index dielectric material 106 on the first surface 104 of theoptical substrate 102, and applying 15.00 nm of the high indexdielectric material 202 on the first surface 104 of the opticalsubstrate 102. The subsequent applications of dielectric materials areas described above. Table 500 also provides an example of the stackdesign utilized to create the layering/coating of dielectric materials.Consequently, the method 800 is effective in protecting the eyes fromharmful backside UV reflection; increasing visible light transmissionfor the visible spectrum; and reflecting infrared light away from theeye.

Another exemplary reflectance graph 600 is shown in FIG. 6. The graph600 shows an example of the reflectance spectrum after application ofthe low and high index dielectric materials. The effects across theultraviolet, visible, and near infrared spectrum are shown. Thisrepresents an embodiment when the high index dielectric material 202includes, not only ZrO₂, but also, Indium Zinc Oxide (IZO) 204. Similarto graph 400, the layering dielectric materials causes a reduction ofreflection of ultraviolet light, and an increase in the reflection ofinfrared spectrum. The IZO 204 also works to enhance absorption ofhigh-energy visible light by the optical substrate 102 however.

As Table 700 in FIG. 7 shows, the method 800 involves applyingalternating layers of dielectric materials in multiple coats comprisinga low index dielectric material 106, a high index dielectric material202, and an Indium Zinc Oxide material. This includes applying 145.00 nmof the low index dielectric material 106 on the first surface 104 of theoptical substrate 102; and applying 15.19 nm of the high indexdielectric material 202 on the first surface 104 of the opticalsubstrate 102. The subsequent applications of dielectric materials areas described above. Table 700 also provides an example of a stack designutilized to create the layering/coating of dielectric materials. In anycase, the addition of IZO is effective for protecting the eyes fromharmful backside UV reflection; absorbing HEV light; increasing visiblelight transmission for the visible spectrum; and reflecting infraredlight away from the eye.

FIG. 8 references a flowchart of an exemplary method 800 for coating athin film optical lens 100. The method 800 is configured to applyalternating layers with varying thicknesses of a low index dielectricmaterial 106 and a high index dielectric material 202 on at least one ofthe surfaces 104, 200 of the optical substrate 102, described above. Thelow and high index dielectric materials 106, 202, 204 are layered on theoptical substrate 102 through thin film deposition means to create adesired spectral result in the optical substrate 102. The low indexdielectric material 106 can include SiO₂. The high index dielectricmaterial 202 can include ZrO₂, or possibly an Indium Zinc Oxide 204material.

In some embodiments, the method 800 may include an initial Step 802 ofproviding an optical substrate 102, the optical substrate 102 comprisinga first surface 104 and an opposing second surface 200, the firstsurface 104 being operable to at least partially reflect infraredradiation, the second surface 200 being operable to at least partiallytransmit ultraviolet light in the wavelength range between 300 to 400nanometers. Another Step 804 may include cleaning the surfaces of theoptical substrate 102. The cleaning may include simple hand-cleaning ofthe optical substrate 102 with a lens-friendly cloth.

The method 800 also includes a Step 806 of applying a low indexdielectric material 106 and a high index dielectric material 202 on atleast one of the first and second surfaces 104, 200 of the opticalsubstrate 102. In one possible embodiment, the low index dielectricmaterial 106 comprises a SiO₂ material having a refractive index of1.46. In another embodiment, the high index material is a ZrO₂ material,or possibly an Indium Zinc Oxide 204 (IZO) material. The high indexmaterial may have a refractive index of 2.06. The low index dielectricmaterial 106 and the high index dielectric material 202 being applied ina unique order.

For example, a Step 808 of applying about 145.00 nanometers of the lowindex dielectric material 106 on at least one of the first and secondsurfaces 104, 200 of the optical substrate 102. A Step 810 comprisesapplying about 15.00 nanometers of the high index dielectric material202 on at least one of the first and second surfaces 104, 200 of theoptical substrate 102.

Another Step 812 comprises applying about 17.00 nanometers of the lowindex dielectric material 106 on at least one of the first and secondsurfaces 104, 200 of the optical substrate 102. Yet another Step 814comprises applying about 104.50 nanometers of the high index dielectricmaterial 202 on at least one of the first and second surfaces 104, 200of the optical substrate 102. Another Step 816 comprises applying about153.00 nanometers of the low index dielectric material 106 on at leastone of the first and second surfaces 104, 200 of the optical substrate102.

Yet another Step 818 comprises applying about 103.00 nanometers of thehigh index dielectric material 202 on at least one of the first andsecond surfaces 104, 200 of the optical substrate 102. Yet anotherunique concept of method 800 includes a Step 820, which involvesapplying about 75.00 nanometers of the low index dielectric material 106on at least one of the first and second surfaces 104, 200 of the opticalsubstrate 102.

The application of the low and high index dielectric materials 202 is inan ordered, and specific thickness. Also, the application of dielectricmaterials is performed through the thin film deposition mechanism 300.As a result of this novel application/coating process, the first surface104 of the optical substrate 102 reflects up to 40% of the infraredradiation. And further, the second surface 200 of the optical substrate102 transmits about 99% of the ultraviolet light in the wavelength rangebetween 300 to 400 nanometers.

Thus, the reflection of a substantial amount of infrared radiation, andthe allowance of most of the ultraviolet light in the 300-400 nm range,serve to enhance viewing through the optical substrate 102. Thisachieves the objective of the present invention, which is to reduceinfrared radiation, block HEV light transmission, and reduce backsideultraviolet reflections, while also increasing visible lighttransmission through an optical substrate 102, such as a viewing lens.

It is significant to note that the low and high index dielectricmaterials 202 is applied to one surface, flipping the optical substrate102 and coating the opposite surface in the same manner, or both sidescoated simultaneously. Thus, another Step 822 may include flipping theoptical substrate 102 from the first surface 104 to the second surface200 during application of the dielectric materials. This is the casewhen either of the dielectric materials is applied to only one of thesurfaces. When both the low and high index dielectric materials 202 areapplied, however, the optical substrate 102 still requires to beflipped, because the thin film deposition mechanism 300 generally coatslayers one side at a time.

A final Step 824 followed in the method 800 comprises integrating theoptical substrate 102 into a viewing device. As discussed above, thereflection of infrared radiation, and the allowance of ultraviolet lightin the 300-400 nm range, serve to enhance viewing through the opticalsubstrate 102. Thus, it is advantageous to install the optical substrate102 into a sight scope, a gun sight, a telescope, a pair of glasses, anda viewing device, for example. The optical lens may, however, be used inany situation that requires viewing through a lens, in general.

Although the process-flow diagrams show a specific order of executingthe process steps, the order of executing the steps may be changedrelative to the order shown in certain embodiments. Also, two or moreblocks shown in succession may be executed concurrently or with partialconcurrence in some embodiments. Certain steps may also be omitted fromthe process-flow diagrams for the sake of brevity. In some embodiments,some or all the process steps shown in the process-flow diagrams can becombined into a single process.

In conclusion, the thin film optical lens 100 and method 800 for coatingan optical substrate 102 serves to apply alternating layers, withvarying thicknesses, of a high index dielectric material 202 and a lowindex dielectric material 106 on the first and second surfaces 104, 200of an optical substrate 102. The low and high index dielectric materials106, 202, 204 are layered through thin film deposition. The low indexdielectric material 106 is SiO₂. The high index dielectric material 202is ZrO₂ and/or Indium Zinc Oxide 204. The spectral results fromapplication of high and low index dielectric materials 106 reduceinfrared radiation, block HEV light transmission, and reduce backsideultraviolet reflections, while also increasing visible lighttransmission through the optical substrate 102. As a result of layeringthe dielectric materials, the first surface 104 of optical substrate 102reflects up to 40% of the infrared radiation; and the second surface 200of optical substrate 102 transmits 99% of ultraviolet light in thewavelength range between 300 to 400 nanometers. Both light effects workto enhance viewing through the optical substrate 102.

These and other advantages of the invention will be further understoodand appreciated by those skilled in the art by reference to thefollowing written specification, claims and appended drawings.

Because many modifications, variations, and changes in detail can bemade to the described preferred embodiments of the invention, it isintended that all matters in the foregoing description and shown in theaccompanying drawings be interpreted as illustrative and not in alimiting sense. Thus, the scope of the invention should be determined bythe appended claims and their legal equivalence.

What is claimed is:
 1. A method of coating a thin film optical lens, themethod comprising: providing an optical substrate, the optical substratecomprising a first surface and an opposing second surface, the firstsurface being operable to at least partially reflect infrared radiation,the second surface being operable to at least partially transmitultraviolet light in the wavelength range between 300 to 400 nanometers;cleaning the surfaces of the optical substrate; applying a low indexdielectric material and a high index dielectric material on at least oneof the first and second surfaces of the optical substrate, the low indexdielectric material and the high index dielectric material being appliedin the following order: applying about 145.00 nanometers of the lowindex dielectric material on at least one of the first and secondsurfaces of the optical substrate; applying about 15.00 nanometers ofthe high index dielectric material on at least one of the first andsecond surfaces of the optical substrate; applying about 17.00nanometers of the low index dielectric material on at least one of thefirst and second surfaces of the optical substrate; applying about104.50 nanometers of the high index dielectric material on at least oneof the first and second surfaces of the optical substrate; applyingabout 153.00 nanometers of the low index dielectric material on at leastone of the first and second surfaces of the optical substrate; applyingabout 103.00 nanometers of the high index dielectric material on atleast one of the first and second surfaces of the optical substrate; andapplying about 75.00 nanometers of the low index dielectric material onat least one of the first and second surfaces of the optical substrate,whereby the applied dielectric materials enable the first surface toreflect up to 40 percent of the infrared radiation, whereby the applieddielectric materials enable the second surface to transmit about 99percent of the ultraviolet light in the wavelength range between 300 to400 nanometers.
 2. The method of claim 1, further comprisinghand-cleaning the surfaces of the optical substrate.
 3. The method ofclaim 1, further comprising flipping the optical substrate from thefirst surface to the second surface during application of the dielectricmaterials.
 4. The method of claim 1, wherein the optical substratecomprises a viewing lens.
 5. The method of claim 1, further comprisingintegrating the optical substrate into a device.
 6. The method of claim1, wherein the low index dielectric material comprises SiO₂.
 7. Themethod of claim 6, wherein the SiO₂ comprises a refractive index of1.46.
 8. The method of claim 1, wherein the high index dielectricmaterial comprises ZrO₂.
 9. The method of claim 8, wherein the ZrO₂comprises a refractive index of 2.06.
 10. The method of claim 1, whereinthe high index dielectric material comprises Indium Zinc Oxide.
 11. Themethod of claim 1, wherein the dielectric materials are applied with athin film deposition mechanism.
 12. The method of claim 11, wherein thethin film deposition mechanism comprises an electron beam evaporationand a magnetron reactive sputtering.
 13. A method of coating a thin filmoptical lens, the method comprising: providing an optical substrate, theoptical substrate comprising a first surface and an opposing secondsurface, the first surface being operable to at least partially reflectinfrared radiation, the second surface being operable to at leastpartially transmit ultraviolet light in the wavelength range between 300to 400 nanometers; hand-cleaning the surfaces of the optical substrate;applying SiO₂ and ZrO₂ on at least one of the first and second surfacesof the optical substrate, the SiO₂ and the ZrO₂ being applied in thefollowing order: applying about 145.00 nanometers of the SiO₂ on atleast one of the first and second surfaces of the optical substrate;applying about 15.00 nanometers of the ZrO₂ on at least one of the firstand second surfaces of the optical substrate; applying about 17.00nanometers of the SiO₂ on at least one of the first and second surfacesof the optical substrate; applying about 104.50 nanometers of the ZrO₂on at least one of the first and second surfaces of the opticalsubstrate; applying about 153.00 nanometers of the SiO₂ on at least oneof the first and second surfaces of the optical substrate; applyingabout 103.00 nanometers of the ZrO₂ on at least one of the first andsecond surfaces of the optical substrate; applying about 75.00nanometers of the SiO₂ on at least one of the first and second surfacesof the optical substrate; and flipping the optical substrate from thefirst surface to the second surface during application of the dielectricmaterials, whereby the applied dielectric materials enable the firstsurface to reflect up to 40 percent of the infrared radiation, wherebythe dielectric materials enable the second surface to transmit about 99percent of the ultraviolet light in the wavelength range between 300 to400 nanometers.
 14. The method of claim 13, further comprisingintegrating the optical substrate into a viewing device.
 15. The methodof claim 13, wherein the SiO₂ comprises a refractive index of 1.46. 16.The method of claim 13, wherein the ZrO₂ comprises a refractive index of2.06.
 17. The method of claim 13, further comprising a step of applyingIndium Zinc Oxide on at least one of the first and second surfaces ofthe optical substrate.
 18. The method of claim 13, wherein thedielectric materials are applied with a thin film deposition mechanism.19. The method of claim 18, wherein the thin film deposition mechanismcomprises an electron beam evaporation and a magnetron reactivesputtering.
 20. A thin film optical lens, the lens comprising: anoptical substrate comprising a first surface and an opposing secondsurface, the first surface being operable to at least partially reflectinfrared radiation, the second surface being operable to at leastpartially transmit ultraviolet light in the wavelength range between 300to 400 nanometers; a cleaner operable to clean the surfaces of theoptical substrate; and a low index dielectric material comprising SiO₂;and a high index dielectric material comprising ZrO₂ or Indium ZincOxide, whereby the dielectric materials are applied on at least one ofthe first and second surfaces of the optical substrate in the followingorder: about 145.00 nanometers of the low index dielectric material,about 15.00 nanometers of the high index dielectric material, about17.00 nanometers of the low index dielectric material, about 104.50nanometers of the high index dielectric material, about 153.00nanometers of the low index dielectric material, about 103.00 nanometersof the high index dielectric material, about 75.00 nanometers of the lowindex dielectric material, whereby the applied dielectric materialsenable the first surface to reflect up to 40 percent of the infraredradiation, whereby the dielectric materials enable the second surface totransmit about 99 percent of the ultraviolet light in the wavelengthrange between 300 to 400 nanometers.